机读格式显示(MARC)

• 000 01367nam 2200337 a 4500

• 001 0000398009

• 003 SCNU

• 008 830128s1982 njua b 101 0 eng

• 010 __ |a 82082859

• 040 __ |a DLC |c DLC |d DLC

• 050 00 |a TA2005 |b .S95 1981

• 082 00 |a 621.044 |2 19

• 093 __ |a O53 |2 4

• 111 2_ |a Symposium on Plasma Processing |n (3rd : |d 1981 : |c Denver, Colo.)

• 245 10 |a Plasma processing : |b proceedings of the third Symposium on Plasma Processing / |c edited by J. Dieleman, R.G. Frieser, G.S. Mathad ; [sponsored by] Dielectrics and Insulation and Electronics Divisions.

• 260 __ |a Pennington, N.J. (10 S. Main St., Pennington 08534) : |b Electrochemical Society, |c c1982.

• 300 __ |a xi, 516 p. : |b ill. ; |c 23 cm.

• 490 1_ |a Proceedings / The Electrochemical Society ; |v v. 82-6

• 504 __ |a Includes bibliographical references and indexes.

• 650 _0 |a Plasma engineering |x Congresses.

• 700 1_ |a Mathad, G. S.

• 700 1_ |a Frieser, R. G.

• 700 1_ |a Dieleman, J.

• 710 2_ |a Electrochemical Society. |b Electronics Division.

• 710 2_ |a Electrochemical Society. |b Dielectrics and Insulation Division.

• 830 _0 |a Proceedings (Electrochemical Society) ; |v v. 82-6.

• 950 __ |a SCNU |f O53/S989

• 999 __ |t C |A luol |a 20050713 10:53:07 |M luol |m 20050713 10:55:40

• 000 1000011428

• 991 __ |a 022005006937

• 907 __ |a SCNU |f O53/S989