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• 000 01378cam a2200349 i 4500

• 001 0000767568

• 003 SCNU

• 005 20230109113600.0

• 008 220406r20212013cc ac b 000 0 eng d

• 020 __ |a 9787560396385 |q paperback

• 040 __ |a WHUT |b eng |c WHUT |d SCT |e rda

• 041 0_ |a eng |b chi

• 093 __ |a O53 |2 5

• 099 __ |a CAL 022022024247

• 100 1_ |a Conde, Luis, |e author.

• 245 13 |a An introduction to plasma physics and its space applications / |c Luis, Conde = 等离子体物理及其空间应用导论 / (美) 路易斯·孔德著.

• 246 31 |a 等离子体物理及其空间应用导论

• 264 _1 |a 哈尔滨 : |b Harbin Institute of Technology Press, |c 2021.

• 300 __ |a 1 volume (various pagings) : |b illustrations (some color), color portrait ; |c 24 cm.

• 336 __ |a text |b txt |2 rdacontent

• 337 __ |a unmediated |b n |2 rdamedia

• 338 __ |a volume |b nc |2 rdacarrier

• 490 0_ |a 国外优秀物理著作原版系列

• 500 __ |a "编辑手记" is written by 刘培杰.

• 504 __ |a Includes biliographical references.

• 505 00 |g Volume 1. |t Fundamentals and elementary processes = 基本原理和初步过程

• 534 __ |p Reprint. Originally published: |c United States : Morgan & Claypool Publishers ,c2018.

• 546 __ |a Text in English; with Chinese editor's note.

• 650 _0 |a Plasma (Ionized gases)

• 700 1_ |a Liu, Peijie |9 (刘培杰), |e writer of Chinese note.

• 920 __ |a 242430 |z 1

• 950 __ |a SCNU |f O53/C745