机读格式显示(MARC)

• 000 01242nam 2200313 a 4500

• 001 0000398464

• 003 SCNU

• 008 840626s1983 njua b 101 0 eng

• 010 __ |a 83082041

• 040 __ |a DLC |c DLC |d CIN

• 050 0_ |a TA2005 |b .S95 1983

• 082 0_ |a 621/.044 |2 19

• 093 __ |a O53-53 |2 4

• 111 2_ |a Symposium on Plasma Processing |n (4th : |d 1983 : |c San Francisco, Calif.)

• 245 10 |a Proceedings of the fourth Symposium on Plasma Processing / |c edited by G.S. Mathad, G.C. Schwartz, G. Smolinsky.

• 260 __ |a Pennington, NJ (10 S. Main St., Pennington 08534-2896) : |b Dielectrics and Insulation and Electronics Divisions, Electrochemical Society, |c c1983.

• 300 __ |a x, 649 p. : |b ill. ; |c 23 cm.

• 490 1_ |a Proceedings / The Electrochemical Society ; |v v. 83-10.

• 504 __ |a Includes bibliographical references and indexes.

• 650 _0 |a Plasma engineering |x Congresses.

• 700 1_ |a Mathad, G. S.

• 700 1_ |a Schwartz, G. C.

• 700 1_ |a Smolinsky, G.

• 830 _0 |a Proceedings (Electrochemical Society) ; |v v. 83-10.

• 950 __ |a SCNU |f O53-53/I61.2

• 999 __ |t C |A luol |a 20050713 16:44:37 |M luol |m 20050713 16:46:46 |G luol |g 20050713 16:47:50

• 000 1000011890

• 991 __ |a 022005007397

• 907 __ |a SCNU |f O53-53/I61.2