机读格式显示(MARC)

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• 008 830420s1983 wb a b 10100 eng

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• 020 __ |a 3540124918 (Berlin)

• 020 __ |a 0387124918 (U.S.)

• 040 __ |c WUL

• 050 0_ |a TK7871.85 |b .I5864 1983

• 082 0_ |a 621.3815/2 |2 19

• 093 __ |a TN305.3-53 |2 4

• 099 __ |a CAL 022000386737 |a CAL 022000327085

• 245 00 |a Ion implantation : |b equipment and techniques : proceedings of the Fourth International Conference, Berchtesgaden, Fed. Rep. of Germany, September 13-17, 1982 / |c editors, H. Ryssel and H. Glawischnig.

• 260 __ |a Berlin ; |a New York : |b Springer-Verlag, |c 1983.

• 300 __ |a x, 556 p. : |b ill. ; |c 24 cm.

• 440 _0 |a Springer series in electrophysics ; |v v. 11

• 504 __ |a Includes bibliographical references and index.

• 650 _0 |a Semiconductor doping |x Congresses.

• 650 _0 |a Ion implantation |x Congresses.

• 700 10 |a Glawischnig, H. |q (Hans), |d 1939-

• 700 10 |a Ryssel, Heiner, |d 1941-

• 711 20 |a International Conference on Ion Implantation: Equipment and Techniques |n (4th : |d 1982 : |c Berchtesgaden, Germany)

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• 920 __ |a 231030 |b TN305.3-53 |c I61O 1982 |z 1

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• 950 __ |a SCNU |f TN305.3-53/I61

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