机读格式显示(MARC)

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• 008 971008s1983 nyua 00110 eng

• 020 __ |a 0126747806

• 040 __ |c SJT

• 050 0_ |a TP156.V3 |b S78 1983

• 082 0_ |a 621.5/5 |2 19

• 093 __ |a TB7 |2 4

• 099 __ |a CAL 022000307942

• 100 1_ |a Stuart, R.V.

• 245 10 |a Vacuum technology, thin films, and sputtering : |b an introduction / |c R.V. Stuart.

• 260 __ |a New York : |b Academic Press, |c 1983.

• 300 __ |a viii, 151 p. : |b ill. ; |c 24 cm.

• 500 __ |a Includes index.

• 650 _0 |a Vacuum technology.

• 650 _0 |a Thin films.

• 650 _0 |a Cathode sputtering (Plating process)

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• 950 __ |a SCNU |f TB7/S932

• 998 __ |a SJT

• 999 __ |t C |A lm2 |a 20050716 17:33:57 |M lm2 |m 20050716 17:34:30

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• 907 __ |a SCNU |f TB7/S932