机读格式显示(MARC)

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• 040 __ |c SJT

• 050 0_ |a TK7871.85 |b .D79 1984

• 082 0_ |a 621.381/73

• 093 __ |a TN405.2 |2 4

• 099 __ |a CAL 022000308153

• 245 00 |a Dry etching for microelectronics / |c edited by Ronald A. Powell.

• 260 __ |a Amsterdam ; |a New York : |b North-Holland Physics Pub. ; |a New York, N.Y. : |b Distributors for the USA and Canada, Elsevier Science Pub. Co., |c 1984.

• 300 __ |a xi, 299 p. : |b ill. ; |c 24 cm.

• 490 1_ |a Materials processing--theory and practices ; |v v. 4

• 500 __ |a Includes index.

• 504 __ |a Bibliography: p. 223-294.

• 650 _0 |a Semiconductors |x Etching.

• 650 _0 |a Plasma etching.

• 700 10 |a Powell, Ronald A.

• 830 _0 |a Materials processing, theory and practices ; |v v. 4.

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• 950 __ |a SCNU |f TN405.2/P882

• 998 __ |a SJT

• 999 __ |t C |A wp |a 20050716 10:59:06 |M wp |m 20050716 11:00:10

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• 907 __ |a SCNU |f TN405.2/P882